Universität Innsbruck
Institut für Ionenphysik und Angewandte Physik - TFT

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Publications

• Huber, D.; Pulker, H.K.; ITO-coatings by reactive low-voltage ion plating: film properties and plasma analysis; Vakuum in Forschung und Praxis, 2009, 29-34, Vol. 21, No. 3.
• Pulker, H.K.; Huber, D.; ITO Films Produced by Reactive Low-Voltage Ion Plating; Materials, Jul. 2008, 14-15.
• Hallbauer, A.; Huber, D.; Strauss, G.N.; Schlichtherle, S.; Kunz, A.; Pulker, H.K.; Overview about the optical properties and mechanical stress of different dielectric thin films produced by reactive-low-voltage-ion-plating; Thin Solid Films, 2008, 4587-4592, Vol. 516.
• Strauss, G.N.; Schlichtherle, S.; Pulker, H.K.; Plasma investigation of PVD processes operating in dc continuous and/or dc pulsed mode; Vakuum in Forschung und Praxis, 2007, 6-12, Vol. 19, No. 4.
• Pulker, H.K.; Structure, Density, and Topography of Metal Oxide Films; Materials, Jul. 2007, 12-13.
• Hallbauer, A.; Huber, D.; Klauser, F.; Kunz, A.; Tessadri, R.; Kaiser, U.; Yulin, S.; Pulker, H.K.; Optical and Structural Characteristics of Ion-Plated Nb2O5 and HfO2 Films; Plasma Processes and Polymers, 2007, S53-S58, Vol. 4, Issue S1.
• Huber, D.; Prein, F.; Pulker, H.K.; Laser treatment of optical Nb2O5- and HfO2-films; Vakuum in Forschung und Praxis, 2007, 31-35, Vol. 19, No. 2.
• Kunz, A.; Hallbauer, A.; Huber, D.; Pulker, H.K.; Optische und mechanische Eigenschaften von RLVIP HfO2-Schichten; Vakuum in Forschung und Praxis, 2006, 12-16, Vol. 18, No. 5.
• Hallbauer, A.; Huber, D.; Kunz, A.; Pulker, H.K.; Optical and Mechanical Properties of different Dielectric Thin Films produced by Reactive-Low-Voltage-Ion-Plating (RLVIP), 6th International Conference on Coatings on Glass and Plastics, 2006, 321-326.
• Hübner, S.; Pulker, H.K.; Wasserpermeation durch Polymere und keramische Substrate; Vakuum in Forschung und Praxis, 2006, 6-11, Vol. 18, No. 3.
• Frick, D.; Pulker, H.K.; Easy-to-clean Schichten - spezielle Anwendungen; Vakuum in Forschung und Praxis, 2006, 16-19, Vol. 18, No. 2.
• Pulker, H.K.; Cold Plasma for Surface Modification and Coating of Various Substrates; Materials, Dec. 2005, 12-13.
• Hallbauer, A.; Huber, D.; Pulker, H.K.; Optical and mechanical properties of thin RLVIP Nb2O5-films; Proceedings of SPIE - Advances in Optical Thin Films II, 2005, 59631F1-59631F9, Vol. 5963.
• Huber, D.; Hallbauer, A.; Pulker, H.K.; Plasma monitoring of the RLVIP-process with a Langmuir probe; Proceedings of SPIE - Advances in Optical Thin Films II, 2005, 59630G1-59630G9, Vol. 5963.
• Schlichtherle, S.; Strauss, G.N.; Tafelmaier, H.; Huber, D.; Pulker, H.K.; Reactive Low Voltage Ion Plating (RLVIP); Vakuum in Forschung und Praxis, 2005, 210-217, Vol. 17, No. 4.
• Pulker, H.K.; Deposition Technologies, Starting Materials, and Film Properties; Materials, Dec. 2004, 14-15.
• Lechleitner, T.; Nagl, M.; Pulker, H.K.; Hochmair, E.; Verkapselung medizinischer elektronischer Implantate; Galvanotechnik, 2004, 1732-1736, Vol. 95, No. 7.
• Pulker, H.K.; High Quality Coating with Pure Materials and Clean Substrates; Materials, July 2004, 14-15.
• Coada, D.; Nagl, M.; Lechleitner, T.; Pulker, H.K.; The influence of different working gases on the qualities of SiO2 nanostructures; Romanian Reports in Physics, 2004, 328-331, Vol. 56, No. 3.
• Strauss, G.N.; Stärz, R.; Pulker, H.K.; Kaiser, N.; Plasmaanalyse mit dem MIEDA-System; Galvanotechnik, 2004, 1254-1256, Vol. 95, No. 5.
• Pulker, H.K.; Schlichtherle, S.; Density-related properties of metal oxide films; Proceedings of the SPIE - The International Society for Optical Engineering, 2004, 1-11, Vol. 5250.
• Pulker, H.K.; Microstructure of Thin Films; Materials, Nov. 2003, 14-15.
• Lechleitner, T.; Nagl, M.; Pulker, H.K.; Hochmair, E.; Barriereschichten für medizinische elektronische Implantate; Vakuum in Forschung und Praxis, 2003, 241-244, Vol. 15, No. 5.
• Pulker, H.K.; Ion Plating - Past and Present; Materials, July 2003, 14-15.
• Coada, D.; Nagl, M.; Lechleitner, T.; Pulker, H.K.; Different properties of SiO2 nanostructures with different working gases; Journal of Optoelectronics and Advanced Materials, 2003, 687-691, Vol. 5.
• Strauss, G.N.; Pulker, H.K.; Meyer, M.; Hatto, P.; Davis, C.; Jehn, H.; Balzer, M.; Misiano, C.; Silipo, V.; Olzi, E.; Molena, R.; Passaretti, F.; Low-Vacuum Low-Cost Deposition of Tribological Coatings; Vakuum in Forschung und Praxis, 2003, 134-138, Vol. 15, No. 3.
• Schlichtherle, S.; Huber, D.; Pulker H.K.; Influence of Relevant Gas Pressure on the Properties of Ion-plated Ta2O5 Films (RLVIP); Vakuum in Forschung und Praxis, 2003, 83-85, Vol. 15, No. 2.
• Kaiser, N.; Pulker, H.K.; Optical Interference Coatings; Verlag Springer, Berlin, 2003.
• Coada, D.; Lechleitner, T.; Nagl, M.; Pulker, H.K.; On the RF-sputtered SiO2 nanostructure deposited with different working gases (Ar, Kr, Xe); Ovidius University Annals of Physics, 2003, 149-153.
• Pulker, H.K.; Density-related properties of Metal Oxide Films; Materials, Dec. 2002, 14-15.
• Strauss, G.N.; Schlichtherle, S.; Pulker, H.K., Meyer, M.; Jehn, H.; Balzer, M.; Misiano, C.; Silipo, V.; Plasma analysis if different TiN PVD processes at various process parameters; Galvanotechnik, 2002, 1576-1579, Vol. 93, No. 6.
• Pulker, H.K.; Ion and Plasma plated Metal Oxide Films; Materials, Apr. 2002, 20-22.

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